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Local structures of isovalent and heterovalent dilute impurities in Si crystal probed by fluorescence x-ray absorption fine structure

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Title: Local structures of isovalent and heterovalent dilute impurities in Si crystal probed by fluorescence x-ray absorption fine structure
Authors: Wei, Shiqiang Browse this author
Oyanagi, Hiroyuki Browse this author
Kawanami, Hitoshi Browse this author
Sakamoto, Kunihiro Browse this author
Sakamoto, Tsunenori Browse this author
Tamura, Kazuhisa Browse this author
Saini, Naurang L. Browse this author
Uosaki, Kohei Browse this author →KAKEN DB
Keywords: silicon
elemental semiconductors
gallium
germanium
arsenic
impurities
fluorescence
EXAFS
deformation
impurity states
semiconductor doping
Issue Date: 15-Nov-1997
Publisher: American Institute of Physics
Journal Title: Journal of Applied Physics
Volume: 82
Issue: 10
Start Page: 4810
End Page: 4815
Publisher DOI: 10.1063/1.366340
Abstract: Local structures of dilute isovalent and heterovalent impurity atoms in Si crystal (Si:X, X=Ga, Ge, As) have been studied by fluorescence x-ray absorption fine structure. The distortion of local lattice around the impurity atoms was evaluated from the Si-X bond length determined by extended x-ray absorption fine structure. The results demonstrate that the local lattice deformation is strongly dependent on the electronic configuration of impurity atoms, i.e., we find an anomalous expansion (0.09±0.01Å) along the [111] direction for donor (As) atoms but much smaller magnitude (0.03±0.01Å) for isovalent (Ge) atoms and acceptor (Ga) atoms. The results suggest that the local lattice distortions are strongly affected by the Coulomb interactions between the localized charge, which piles up to screen the ion core and the bond charge, and the ion-core repulsion. Absence of anomaly in case of negatively charged Ga atoms suggests that the former mechanism is a dominant factor for anomalous lattice expansion.
Rights: Copyright 1997 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics. The following article appeared in J. Appl. Phys. 82, 4810 (1997) and may be found at https://dx.doi.org/10.1063/1.366340
Type: article
URI: http://hdl.handle.net/2115/50245
Appears in Collections:理学院・理学研究院 (Graduate School of Science / Faculty of Science) > 雑誌発表論文等 (Peer-reviewed Journal Articles, etc)

Submitter: 魚崎 浩平

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