2024-03-28T15:27:14Zhttps://eprints.lib.hokudai.ac.jp/dspace-oai/requestoai:eprints.lib.hokudai.ac.jp:2115/449102022-11-17T02:08:08Zhdl_2115_20045hdl_2115_139Strong Pressure Effect in the Sublimation from Tetracene Single Crystals and Development of Surface Cleaning Technique for Organic SemiconductorsOhtomo, ManabuItaka, KenjiHasegawa, Tetsuya1000010262148Shimada, Toshihiroopen access© 2011 The Japan Society of Applied Physicstetracene single crystalssurface cleaning techniqueorganic semiconductorsmicroscopic sublimation behavior540We studied the sublimation of tetracene single crystals under vacuum and 1 atm inert gas to develop the surface cleaning technique for organic semiconductors. It was found that the microscopic sublimation behavior is strongly dependent on the gas pressure. Nanometer-scale roughening was observed after heating in vacuum, and layer-by-layer sublimation was observed under 1 atm Ar gas. Reflection high energy electron diffraction analysis of the topmost surface showed streak patterns, indicating that surface contaminants were successfully removed.The Japan Society of Applied Physics2011engjournal articleVoRhttp://hdl.handle.net/2115/44910https://doi.org/10.1143/APEX.4.0216011882-07781882-0786AA12295133Applied Physics Express42021601-1021601-3https://eprints.lib.hokudai.ac.jp/dspace/bitstream/2115/44910/3/tetrasublim20101215revised.pdfapplication/pdf234.18 KB2011