2024-03-29T07:45:33Zhttps://eprints.lib.hokudai.ac.jp/dspace-oai/requestoai:eprints.lib.hokudai.ac.jp:2115/836182022-11-17T02:08:08Zhdl_2115_20045hdl_2115_139A Self-Calibration Stitching Method for Pitch Deviation Evaluation of a Long-Range Linear Scale by Using a Fizeau InterferometerXiong, XinShimizu, YukiMatsukuma, HirakuGao, Weimetadata only accessoptical encoderlinear scalepitch deviationstitching interferometryself-calibration532An interferometric self-calibration method for the evaluation of the pitch deviation of scale grating has been extended to evaluate the pitch deviation of the long-range type linear scale by utilizing the stitching interferometry technique. Following the previous work, in which the interferometric self-calibration method was proposed to assess the pitch deviation of the scale grating by combing the first-order diffracted beams from the grating, a stitching calibration method is proposed to enlarge the measurement range. Theoretical analysis is performed to realize the X-directional pitch deviation calibration of the long-range linear scale while reducing the second-order accumulation effect by canceling the influence of the reference flat error in the sub-apertures' measurements. In this paper, the stitching interferometry theory is briefly reviewed, and theoretical equations of the X-directional pitch deviation stitching are derived for evaluation of the pitch deviation of the long-range linear scale. Followed by the simulation verification, some experiments with a linear scale of 105 mm length from a commercial interferential scanning-type optical encoder are conducted to verify the feasibility of the self-calibration stitching method for the calibration of the X-directional pitch deviation of the linear scale over its whole area.MDPI2021-11engjournal articleNAhttp://hdl.handle.net/2115/83618https://doi.org/10.3390/s21217412Sensors21217412