2024-03-29T09:49:35Zhttps://eprints.lib.hokudai.ac.jp/dspace-oai/requestoai:eprints.lib.hokudai.ac.jp:2115/457692022-11-17T02:08:08Zhdl_2115_20053hdl_2115_145Experimental proof-of-principle investigation of enhanced Z[sub 3D]T in (001) oriented Si/Ge superlatticesKoga, T.Cronin, S. B.Dresselhaus, M. S.Liu, J. L.Wang, K. L.SiliconGermaniumElemental semiconductorsThermoelectricityThermal conductivitySemiconductor superlattices420An experimental proof-of-principle of an enhanced Z3DT (thermoelectric figure of merit) is demonstrated using (001) oriented Si/Ge superlattices. The highest value of the experimental Z3DT at 300 K for a (001) oriented Si(20 Å)/Ge(20 Å) superlattice is 0.1 using κ = 5 Wm−1 K−1, for the in-plane thermal conductivity, which is a factor of seven enhancement relative to the estimated value of Z3DT = 0.014 for bulk Si. The good agreement between experiment and theory validates our modeling approach (denoted as “carrier pocket engineering”) to design superlattices with enhanced values of Z3DT. Proposals are made to enhance the experimental values of Z3DT for Si/Ge superlattices even further. © 2000 American Institute of Physics.American Institute of PhysicsJournal Articleapplication/pdfhttp://hdl.handle.net/2115/45769https://eprints.lib.hokudai.ac.jp/dspace/bitstream/2115/45769/1/APL77_1490.pdf0003-69511077-3118AA00543431Applied Physics Letters7710149014922000-09-04enginfo:doi/10.1063/1.1308271Copyright 2000 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics. The following article appeared in Appl. Phys. Lett. 77, 1490 (2000) and may be found at https://dx.doi.org/10.1063/1.1308271publisher