2024-03-28T15:04:07Zhttps://eprints.lib.hokudai.ac.jp/dspace-oai/requestoai:eprints.lib.hokudai.ac.jp:2115/734072022-11-17T02:08:08Zhdl_2115_20045hdl_2115_139原料連続供給型引き下げ法によるルチル単結晶の育成Growth of rutile single crystals by the pulling-down method with continuous feeding樋口, 幹雄硎, 琢己小平, 紘平結晶Rutile single crystals 25 mm in diameter were grown by a newly developed pulling-down method with continuous feeding. An iridium crucible was used as a rf-suscepter and a melt-supporting plate. The used of a heat-shielding plate made of porous zirconia was essential to perform smooth seed touch and stable growth run.日本結晶成長学会Conference Paperapplication/pdfhttp://hdl.handle.net/2115/73407https://eprints.lib.hokudai.ac.jp/dspace/bitstream/2115/73407/1/jacg25.3.A1.pdf0385-62752187-8366AN00188386日本結晶成長学会誌253A11998-07-01jpninfo:doi/10.19009/jjacg.25.3_A1著作権は日本結晶成長学会にある。publisher