2024-03-29T00:20:37Zhttps://eprints.lib.hokudai.ac.jp/dspace-oai/requestoai:eprints.lib.hokudai.ac.jp:2115/748692022-11-17T02:08:08Zhdl_2115_20045hdl_2115_139SIMSによる高純度銅中の微量金属不純物の定量分析Quantitative SIMS Analysis of Trace Metallic Impurities in High Purity Copper竹下, 博之香川, 卓也鈴木, 亮輔大石, 敏雄小野, 勝敏secondary ion mass spectrometryimpurity in copperquantitative analysishigh resolution analysisisotopic abundance560Quantitative analysis of trace amounts of dominant impurities in copper, Ag, Fe, Ni and Pb, were studied using secondary ion mass spectrometry (SIMS). Based on the survey of the secondary ions species, which disturbed the detection of atomic ions of impurities, the removal of these disturbance is proposed as the two methods; applying the high resolution of mass spectrometry, and calculating the isotopic abundance. The precision, detection limit and relative sensitivity factor were experimentally discussed to establish the reliable quantitative SIMS analysis at the local area of high purity copper.日本金属学会Journal Articleapplication/pdfhttp://hdl.handle.net/2115/74869https://eprints.lib.hokudai.ac.jp/dspace/bitstream/2115/74869/1/J.%20Jpn.%20Inst.%20Met.%2060%283%29%20290.pdf0021-48761880-6880AN00062446日本金属学会誌6032902941996-03-01jpninfo:doi/10.2320/jinstmet1952.60.3_290publisher