2024-03-29T07:19:15Zhttps://eprints.lib.hokudai.ac.jp/dspace-oai/requestoai:eprints.lib.hokudai.ac.jp:2115/762922022-11-17T02:08:08Zhdl_2115_20045hdl_2115_139Ultra-rapid formation of crystalline anatase TiO2 films highly doped with substrate species by a cathodic deposition methodSato, YukiKobayashi, HikaruKowalski, DamianKoyama, AkiraZhu, ChunyuAoki, YoshitakaSuto, MikitoHabazaki, HirokiCathodic depositionAnataseHeat-labile substrateDoped TiO2The formation of crystalline anatase films having important applications such as photocatalysis, solar cells, electrochromic applications, and bio-implants requires time-consuming multiple processes including heat treatments. In this paper, ultra-rapid formation of a crystalline anatase film on a tin substrate is realized by a cathodic deposition method, which is performed only for 3 s in an aqueous solution containing TiF62- at 60 degrees C without any heat treatment. The deposited nanocrystalline anatase film of similar to 90 nm thickness contains high concentration of tin species derived from the substrate metal and shows superhydrophilicity after UV light irradiation. The process utilized in this study provides a novel annealing-free approach for the rapid formation of a photoactive crystalline anatase film on heat-labile substrates.ElsevierJournal Articlehttp://hdl.handle.net/2115/762921388-2481Electrochemistry Communications1081065612019-11enginfo:doi/10.1016/j.elecom.2019.106561none