2024-03-29T05:47:08Zhttps://eprints.lib.hokudai.ac.jp/dspace-oai/requestoai:eprints.lib.hokudai.ac.jp:2115/847082022-11-17T02:08:08Zhdl_2115_20051hdl_2115_144In situ fluorescence yield soft X-ray absorption spectroscopy of electrochemical nickel deposition processes with and without ethylene glycolYamaguchi, AkinobuAkamatsu, NaoyaSaegusa, ShunyaNakamura, RyoUtsumi, YuichiKato, MasaruYagi, IchizoIshihara, TomokoOura, Masaki431The electrochemical Ni deposition at a platinum electrode was investigated in a plating nickel bath in the presence and absence of ethylene glycol (EG) using fluorescence yield soft X-ray absorption spectroscopy (FY-XAS) in the Ni L2,3-edge and O K-edge regions under potential control. At ≤+0.35 V vs. the reversible hydrogen electrode (RHE), the electrochemical Ni deposition was detected by the Ni L2,3-edge FY-XAS in the presence of EG whereas almost no such event was observed in the absence of EG. A drastic decrease of FY-XAS intensities in the O K-edge region was also observed in the presence of EG at >+0.35 V vs. RHE, suggesting that the nano-/micro-structured Ni deposition initiated by the removal of water molecules occurs on the Pt electrode. The complex formation of Ni2+ with EG and the adsorption of EG on the Ni surface could play an important role in the Ni deposition. This study demonstrates that the in situ FY-XAS is a powerful and surface-sensitive technique to understand (electro)chemical reactions including polyol synthesis and electrocatalysis at solid–liquid interfaces.Royal Society of ChemistryJournal Articlehttp://hdl.handle.net/2115/847082046-2069RSC Advances121710425104302022-04-05enginfo:doi/10.1039/D2RA01050Jnone