Hokkaido University Collection of Scholarly and Academic Papers >
Showing results 1 to 3 of 3
Type | Author(s) | Title | Other Titles | Citation | Citation(alt) | Issue Date | article | Shimozuma, M.; Tochitani, G.; Ohno, H.; Tagashira, H.; Nakahara, J. | Hydrogenated amorphous carbon films deposited by low-frequency plasma chemical vapor deposition at room temperature | - | Journal of Applied Physics | - | 1-Jul-1989 |
article | Shimozuma, Mitsuo; Tochitani, Gen; Tagashira, Hiroaki | Optical emission diagnostics of H2+CH4 50-Hz–13.56-MHz plasmas for chemical vapor deposition | - | Journal of Applied Physics | - | 15-Jul-1991 |
article | Shimozuma, M.; Date, H.; Iwasaki, T.; Tagashira, H.; Yoshino, M.; Yoshida, K. | Three-dimensional deposition of TiN film using low frequency (50 Hz) plasma chemical vapor deposition | - | Journal of Vacuum Science & Technology. A, Vacuum, Surfaces, and Films | - | Jul-1997 |
Showing results 1 to 3 of 3
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