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Hokkaido University Collection of Scholarly and Academic Papers >
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| Type | Author(s) | Title | Other Titles | Citation | Citation(alt) | Issue Date | | bulletin (article) | 横山, 勇治; 大野, 英男; 長谷川, 英機; 下妻, 光夫 | ｢非晶質シリコン薄膜トランジスタのドレイン電流ドリフト特性とその機構｣ | Characterization and Mechanism of Drain Current Drift in Hydrogenated Amorphous Silicon Thin Film Transistor | 北海道大學工學部研究報告 | Bulletin of the Faculty of Engineering, Hokkaido University | 30-May-1988 |
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