Hokkaido University Collection of Scholarly and Academic Papers >
Showing results 1 to 3 of 3
Type | Author(s) | Title | Other Titles | Citation | Citation(alt) | Issue Date | article | Uemura, Keisuke; Deki, Manato; Honda, Yoshio; Amano, Hiroshi; Sato, Taketomo | Effect of photoelectrochemical etching and post-metallization annealing on gate controllability of AlGaN/GaN high electron mobility transistors | - | Japanese Journal of Applied Physics (JJAP) | - | 1-Jun-2019 |
article (author version) | Sato, Taketomo; Toguchi, Masachika; Komatsu, Yuto; Uemura, Keisuke | Low-Damage Etching for AlGaN/GaN HEMTs Using Photo-Electrochemical Reactions | - | IEEE transactions on semiconductor manufacturing | - | Nov-2019 |
article | Kumazaki, Yusuke; Uemura, Keisuke; Sato, Taketomo; Hashizume, Tamotsu | Precise thickness control in recess etching of AlGaN/GaN hetero-structure using photocarrier-regulated electrochemical process | - | Journal of Applied Physics | - | 14-May-2017 |
Showing results 1 to 3 of 3
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