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Shimozuma, M.
;
Date, H.
;
Iwasaki, T.
;
Tagashira, H.
;
Yoshino, M.
;
Yoshida, K.
Three-dimensional deposition of TiN film using low frequency (50 Hz) plasma chemical vapor deposition
-
Journal of Vacuum Science & Technology. A, Vacuum, Surfaces, and Films
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Jul-1997
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