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Thermal degradation of anodic niobia on niobium and oxygen-containing niobium

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Title: Thermal degradation of anodic niobia on niobium and oxygen-containing niobium
Authors: Habazaki, H. Browse this author →KAKEN DB
Yamasaki, M. Browse this author
Ogasawara, T. Browse this author
Fushimi, K. Browse this author →KAKEN DB
Konno, H. Browse this author
Shimizu, K. Browse this author
Izumi, T. Browse this author
Matsuoka, R. Browse this author
Skeldon, P. Browse this author
Thompson, G. E. Browse this author
Keywords: anodic oxidation
dielectric properties
niobium oxide
heat treatment
Issue Date: 30-Jan-2008
Publisher: Elsevier
Journal Title: Thin Solid Films
Volume: 516
Issue: 6
Start Page: 991
End Page: 998
Publisher DOI: 10.1016/j.tsf.2007.06.127
Abstract: Thermal treatment of anodized niobium and oxygen-containing niobium has been carried out to elucidate the thermal degradation mechanism of niobium capacitors and to clarify the influence of oxygen dissolved in niobium on thermal degradation. The capacitance and leakage current of the anodized specimens increase with thermal treatment above 423 K in air, although the oxygen content in the substrate has no significant effect up to 523 K. At increased temperatures, the changes in capacitance and leakage current are suppressed with increasing oxygen content. The anodic film formed on the Nb-50 at% O substrate thickens significantly during thermal treatment at 623 K in air, while only a slight reduction of the thickness is evident for those on the niobium and Nb-20 at% O substrates. In contrast, vacuum thermal treatment at 623 K causes thinning of the anodic film on niobium, with evidently no change in the film thickness on the Nb-50 at% O substrate. These are interpreted in terms of oxygen diffusion from the anodic film to the substrate as well as thermal oxide growth.
Type: article (author version)
Appears in Collections:工学院・工学研究院 (Graduate School of Engineering / Faculty of Engineering) > 雑誌発表論文等 (Peer-reviewed Journal Articles, etc)

Submitter: 幅崎 浩樹

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