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北海道大学工学部研究報告 = Bulletin of the Faculty of Engineering, Hokkaido University >
No.132 >

イオンおよび電子線照射によるニッケル/チタン薄膜表面の改質

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Please use this identifier to cite or link to this item:http://hdl.handle.net/2115/42003

Title: イオンおよび電子線照射によるニッケル/チタン薄膜表面の改質
Other Titles: Surface Modification of Nickel/Titanium Thin Film by Means of Ion and Electron Irradiation
Authors: 大貫, 惣明1 Browse this author
三好, 隆宏2 Browse this author
高橋, 平七郎3 Browse this author
望月, 進4 Browse this author
佐藤, 義一5 Browse this author
竹山, 太郎6 Browse this author
Authors(alt): Ohnuki, Soumei1
Miyoshi, Takahiro2
Takahashi, Heishichiro3
Mochizuki, Susumu4
Sato, Yoshikazu5
Takeyama, Taro6
Issue Date: 31-Jul-1986
Publisher: 北海道大学
Journal Title: 北海道大學工學部研究報告
Journal Title(alt): Bulletin of the Faculty of Engineering, Hokkaido University
Volume: 132
Start Page: 173
End Page: 183
Type: bulletin (article)
URI: http://hdl.handle.net/2115/42003
Appears in Collections:北海道大学工学部研究報告 = Bulletin of the Faculty of Engineering, Hokkaido University > No.132

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