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Effect of Substrate Bias on Production and Transport of Etchant Ions in a Magnetic Neutral Loop Discharge Plasma
| Title: | Effect of Substrate Bias on Production and Transport of Etchant Ions in a Magnetic Neutral Loop Discharge Plasma |
| Authors: | Asami, Yusuke Browse this author | | Sugawara, Hirotake Browse this author →KAKEN DB |
| Keywords: | Bias | | etchant | | Monte Carlo method | | NLD plasma | | quadrupole magnetic field | | separatrix |
| Issue Date: | 21-Oct-2014 |
| Publisher: | IEEE |
| Journal Title: | IEEE Transactions on Plasma Science |
| Volume: | 42 |
| Issue: | 10 |
| Start Page: | 2540 |
| End Page: | 2541 |
| Publisher DOI: | 10.1109/TPS.2014.2337753 |
| Abstract: | Production and transport of etchant ions in an RF (13.56 MHz) magnetic neutral loop (NL) discharge plasma in the presence and the absence of an ac (1.695 MHz) substrate bias were simulated using a Monte Carlo method. Under the bias, electrons accelerated near the NL were attracted to the substrate and produced more etchant ions near the substrate than in the absence of the bias. Effect of bias leading to enhancement of the ion inflow to the substrate was discussed. |
| Rights: | © 2014 IEEE. Personal use of this material is permitted. Permission from IEEE must be obtained for all other uses, in any current or future media, including reprinting/republishing this material for advertising or promotional purposes, creating new collective works, for resale or redistribution to servers or lists, or reuse of any copyrighted component of this work in other works. |
| Type: | article (author version) |
| URI: | http://hdl.handle.net/2115/57754 |
| Appears in Collections: | 情報科学院・情報科学研究院 (Graduate School of Information Science and Technology / Faculty of Information Science and Technology) > 雑誌発表論文等 (Peer-reviewed Journal Articles, etc)
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Submitter: 菅原 広剛
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