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Hokkaido University Collection of Scholarly and Academic Papers
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Theses
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博士 (工学)
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窒素プラズマを用いた4H-SiC表面の窒化に関する研究
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Masaharu_Shimabayashi.pdf
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Please use this identifier to cite or link to this item:
https://doi.org/10.14943/doctoral.k13650
Related Items in HUSCAP:
論文内容及び審査の要旨
窒素プラズマを用いた4H-SiC表面の窒化に関する研究 [論文内容及び審査の要旨]
Title:
窒素プラズマを用いた4H-SiC表面の窒化に関する研究
Other Titles:
Studies on surface nitriding of 4H-SiC using nitrogen plasmas
Authors:
嶋林, 正晴
Browse this author
Issue Date:
25-Mar-2019
Publisher:
Hokkaido University
Conffering University:
北海道大学
Degree Report Number:
甲第13650号
Degree Level:
博士
Degree Discipline:
工学
Examination Committee Members:
(主査) 教授 佐々木 浩一, 特任教授 越崎 直人, 教授 富岡 智, 教授 朝倉 清高
Degree Affiliation:
工学院(量子理工学専攻)
Type:
theses (doctoral)
URI:
http://hdl.handle.net/2115/74173
Appears in Collections:
課程博士 (Doctorate by way of Advanced Course)
>
工学院(Graduate School of Engineering)
学位論文 (Theses)
>
博士 (工学)
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