Preparation of double layer film of boron and carbon by pulsed laser deposition

Suda, Yoshiyuki; Suganuma, Y.; Sakai, Y. et al.

Applied Surface Science, 2002, 197-198, 603-606

Permalink : https://hdl.handle.net/2115/10509

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アクセス権	open access
URI	https://hdl.handle.net/2115/10509
タイトル	Preparation of double layer film of boron and carbon by pulsed laser deposition
著者	Suda, Yoshiyuki ; Suganuma, Y. ; Sakai, Y. ; Suzuki, K. ; Tsujino, J. ; Homma, N.
e-Rad_Researcher 70301942 著者名 Suda, Yoshiyuki 須田, 善行
著者名 Suganuma, Y.
著者名 Sakai, Y.
著者名 Suzuki, K.
著者名 Tsujino, J.
著者名 Homma, N.
言語	英語
キーワード	Amorphous carbon
	Boron
	Pulsed laser deposition
	X-ray photoelectron spectroscopy
	Field emission
発行日	2002-09-30
出版者	Elsevier
収録物名	Applied Surface Science
巻(号)	197-198
ページ	603-606
抄録	Double layer films of boron and carbon were prepared by pulsed laser deposition (PLD) on silicon substrates. The film surface morphology was examined by atomic force microscopy (AFM). The chemical composition of the elements, carbon, boron, silicon and oxygen, and bonding state of carbon atoms as a function of the depth from the film surface were analyzed by X-ray photoelectron spectroscopy (XPS) with argon ion sputtering technique. Carbon atoms bonded to boron (C---B) were observed as well as carbon atoms bonded to carbon (C---C).
資源タイプ	学術雑誌論文
出版タイプ	Accepted Manuscript
PISSN	0169-4332
関連情報	URI http://www.sciencedirect.com/science/journal/01694332
関連情報 (isVersionOf)	出版社版DOI https://doi.org/10.1016/S0169-4332(02)00405-1