Thermal degradation of anodic niobia on niobium and oxygen-containing niobium

Habazaki, H.; Yamasaki, M.; Ogasawara, T.; Fushimi, K.; Konno, H.; Shimizu, K.; Izumi, T.; Matsuoka, R.; Skeldon, P.; Thompson, G. E.

Thermal degradation of anodic niobia on niobium and oxygen-containing niobium

Habazaki, H.; Yamasaki, M.; Ogasawara, T. et al.

Thin Solid Films, 2008, 516(6), 991-998

Permalink : https://hdl.handle.net/2115/33038

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アクセス権	open access
URI	https://hdl.handle.net/2115/33038
タイトル	Thermal degradation of anodic niobia on niobium and oxygen-containing niobium
著者	Habazaki, H. ; Yamasaki, M. ; Ogasawara, T. ; Fushimi, K. ; Konno, H. ; Shimizu, K. ; Izumi, T. ; Matsuoka, R. ; Skeldon, P. ; Thompson, G. E.
e-Rad_Researcher 50208568 著者名 Habazaki, H.
著者名 Yamasaki, M.
著者名 Ogasawara, T.
e-Rad_Researcher 20271645 著者名 Fushimi, K.
著者名 Konno, H.
著者名 Shimizu, K.
著者名 Izumi, T.
著者名 Matsuoka, R.
著者名 Skeldon, P.
著者名 Thompson, G. E.
言語	英語
キーワード	anodic oxidation
	dielectric properties
	niobium oxide
	heat treatment
	TEM
	GDOES
	XPS
発行日	2008-01-30
出版者	Elsevier
収録物名	Thin Solid Films
巻(号)	516(6)
ページ	991-998
抄録	Thermal treatment of anodized niobium and oxygen-containing niobium has been carried out to elucidate the thermal degradation mechanism of niobium capacitors and to clarify the influence of oxygen dissolved in niobium on thermal degradation. The capacitance and leakage current of the anodized specimens increase with thermal treatment above 423 K in air, although the oxygen content in the substrate has no significant effect up to 523 K. At increased temperatures, the changes in capacitance and leakage current are suppressed with increasing oxygen content. The anodic film formed on the Nb-50 at% O substrate thickens significantly during thermal treatment at 623 K in air, while only a slight reduction of the thickness is evident for those on the niobium and Nb-20 at% O substrates. In contrast, vacuum thermal treatment at 623 K causes thinning of the anodic film on niobium, with evidently no change in the film thickness on the Nb-50 at% O substrate. These are interpreted in terms of oxygen diffusion from the anodic film to the substrate as well as thermal oxide growth.
資源タイプ	学術雑誌論文
出版タイプ	Accepted Manuscript
PISSN	0040-6090
EISSN	0040-6090
NCID	AA00863068
関連情報	URI http://www.sciencedirect.com/science/journal/00406090
関連情報 (isVersionOf)	出版社版DOI https://doi.org/10.1016/j.tsf.2007.06.127