Strong Pressure Effect in the Sublimation from Tetracene Single Crystals and Development of Surface Cleaning Technique for Organic Semiconductors

Ohtomo, Manabu; Itaka, Kenji; Hasegawa, Tetsuya et al.

Applied Physics Express, 2011, 4(2), 021601-1-021601-3

Permalink : https://hdl.handle.net/2115/44910

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アクセス権	open access
URI	https://hdl.handle.net/2115/44910
タイトル	Strong Pressure Effect in the Sublimation from Tetracene Single Crystals and Development of Surface Cleaning Technique for Organic Semiconductors
著者	Ohtomo, Manabu ; Itaka, Kenji ; Hasegawa, Tetsuya ; Shimada, Toshihiro
著者名 Ohtomo, Manabu
著者名 Itaka, Kenji
著者名 Hasegawa, Tetsuya
e-Rad_Researcher 10262148 著者名 Shimada, Toshihiro
言語	英語
キーワード	tetracene single crystals
	surface cleaning technique
	organic semiconductors
	microscopic sublimation behavior
発行日	2011
出版者	The Japan Society of Applied Physics
収録物名	Applied Physics Express
巻(号)	4(2)
ページ	021601-1-021601-3
抄録	We studied the sublimation of tetracene single crystals under vacuum and 1 atm inert gas to develop the surface cleaning technique for organic semiconductors. It was found that the microscopic sublimation behavior is strongly dependent on the gas pressure. Nanometer-scale roughening was observed after heating in vacuum, and layer-by-layer sublimation was observed under 1 atm Ar gas. Reflection high energy electron diffraction analysis of the topmost surface showed streak patterns, indicating that surface contaminants were successfully removed.
資源タイプ	学術雑誌論文
出版タイプ	Version of Record
権利情報	© 2011 The Japan Society of Applied Physics
PISSN	1882-0778
EISSN	1882-0786
NCID	AA12295133
関連情報 (isIdenticalTo)	出版社版DOI https://doi.org/10.1143/APEX.4.021601