Quantum lithography under imperfect conditions : effects of loss and dephasing on two-photon interference fringes

Fujiwara, Hideki; Kawabe, Yoshio; Okamoto, Ryo; Takeuchi, Shigeki; Sasaki, Keiji

Quantum lithography under imperfect conditions : effects of loss and dephasing on two-photon interference fringes

Fujiwara, Hideki; Kawabe, Yoshio; Okamoto, Ryo et al.

Journal of the Optical Society of America B : Optical Physics, 2011, 28(3), 422-431

Permalink : https://hdl.handle.net/2115/45032

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アクセス権	open access
URI	https://hdl.handle.net/2115/45032
タイトル	Quantum lithography under imperfect conditions : effects of loss and dephasing on two-photon interference fringes
著者	Fujiwara, Hideki ; Kawabe, Yoshio ; Okamoto, Ryo ; Takeuchi, Shigeki ; Sasaki, Keiji
e-Rad_Researcher 10374670 著者名 Fujiwara, Hideki
著者名 Kawabe, Yoshio
e-Rad_Researcher 10435951 著者名 Okamoto, Ryo
e-Rad_Researcher 80321959 著者名 Takeuchi, Shigeki
e-Rad_Researcher 00183822 著者名 Sasaki, Keiji
言語	英語
発行日	2011-03-01
出版者	Optical Society of America
収録物名	Journal of the Optical Society of America B : Optical Physics
巻(号)	28(3)
ページ	422-431
抄録	We propose a method to simulate a two-photon interference fringe by using a density matrix in order to describe various types of imperfections in the input state. Using this method, we numerically discuss the influence of various imperfections in an input state, such as dephasing and misalignment, on the quality (visibility and period) of the two-photon interference fringes. Applying this method to experimental data, we succeeded in numerically reproducing a two-photon interference fringe using the experimentally obtained density matrix, in which almost no free fitting parameters are required. From the results, because the main cause of the degradation of an interference fringe was found to be the limited aperture size of a two-photon detector, we can observe a two-photon interference fringe with a visibility of up to 94% in the experiments if an efficient two-photon absorbing material or a two-photon detector with a sufficiently high spatial resolution can be used.
資源タイプ	学術雑誌論文
出版タイプ	Version of Record
権利情報	© 2011 Optical Society of America
PISSN	0740-3224
関連情報 (isIdenticalTo)	出版社版DOI https://doi.org/10.1364/JOSAB.28.000422