Microstructure formation during the annealing of iron nitrides

Saito, R.; Masubuchi, Y.; Motohashi, T. et al.

Materials Research Bulletin, 2011, 46(4), 547-550

Permalink : https://hdl.handle.net/2115/45260

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アクセス権	open access
URI	https://hdl.handle.net/2115/45260
タイトル	Microstructure formation during the annealing of iron nitrides
著者	Saito, R. ; Masubuchi, Y. ; Motohashi, T. ; Kikkawa, S. ; Sasaki, M.
著者名 Saito, R.
著者名 Masubuchi, Y.
著者名 Motohashi, T.
著者名 Kikkawa, S.
著者名 Sasaki, M.
言語	英語
キーワード	Nitrides
	Optical materials
	Laser annealing
	Sputtering
発行日	2011-04
出版者	Elsevier
収録物名	Materials Research Bulletin
巻(号)	46(4)
ページ	547-550
抄録	The thermal metastability of iron nitride was exploited to fabricate thin-film microstructures applicable to left-handed metamaterials. A granular thin film containing dispersed iron particles was prepared by post-annealing an rf-sputter-deposited Fe0.5Al0.5N thin film with a wurtzite-type structure in a nitrogen atmosphere at 450℃. The obtained samples showed magnetic resonance in the microwave region. Laser direct writing was also applied in a nitrogen atmosphere to an rf-sputter-deposited Fe0.7Al0.3N thin film. 200 μm-wide, 300 Ωcm iron metal lines were drawn in a host nitride film of approximately 2 kΩcm. Combining and optimizing the above negative permeability and permittivity values should provide left-handed materials with a negative refractive index.
資源タイプ	学術雑誌論文
出版タイプ	Accepted Manuscript
PISSN	0025-5408
関連情報 (isVersionOf)	出版社版DOI https://doi.org/10.1016/j.materresbull.2010.12.032