Homogeneous nano-patterning using plasmon-assisted photolithography

Ueno, Kosei; Takabatake, Satoaki; Onishi, Ko; Itoh, Hiroko; Nishijima, Yoshiaki; Misawa, Hiroaki

Homogeneous nano-patterning using plasmon-assisted photolithography

Ueno, Kosei; Takabatake, Satoaki; Onishi, Ko et al.

Applied Physics Letters, 2011, 99(1), 011107

Permalink : https://hdl.handle.net/2115/46881

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アクセス権	open access
URI	https://hdl.handle.net/2115/46881
タイトル	Homogeneous nano-patterning using plasmon-assisted photolithography
著者	Ueno, Kosei ; Takabatake, Satoaki ; Onishi, Ko ; Itoh, Hiroko ; Nishijima, Yoshiaki ; Misawa, Hiroaki
著者名 Ueno, Kosei
著者名 Takabatake, Satoaki
著者名 Onishi, Ko
著者名 Itoh, Hiroko
著者名 Nishijima, Yoshiaki
著者名 Misawa, Hiroaki
言語	英語
発行日	2011-07-04
出版者	American Institute of Physics
収録物名	Applied Physics Letters
巻(号)	99(1)
ページ	011107
抄録	We report an innovative lithography system appropriate for fabricating sharp-edged nanodot patterns with nanoscale accuracy using plasmon-assisted photolithography. The key technology is two-photon photochemical reactions of a photoresist induced by plasmonic near-field light and the scattering component of the light in a photoresist film. The scattering component of the light is a radiation mode from higher order localized surface plasmon resonances scattered by metallic nanostructures.
資源タイプ	学術雑誌論文
出版タイプ	Version of Record
権利情報	Copyright 2011 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics. The following article appeared in Appl. Phys. Lett. 99, 011107 (2011) and may be found at https://dx.doi.org/10.1063/1.3606505
PISSN	0003-6951
関連情報 (isIdenticalTo)	出版社版DOI https://doi.org/10.1063/1.3606505