Corrosion resistant TiO2 film formed on magnesium by liquid phase deposition treatment

Fujita, R.; Sakairi, M.; Kikuchi, T. et al.

Electrochimica Acta, 2011, 56(20), 7180-7188

Permalink : https://hdl.handle.net/2115/47210

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アクセス権
open access
URI
https://hdl.handle.net/2115/47210
タイトル
Corrosion resistant TiO2 film formed on magnesium by liquid phase deposition treatment
著者
Fujita, R. ; Sakairi, M. ; Kikuchi, T. ; Nagata, S.
著者名
Fujita, R.
e-Rad_Researcher
50280847
著者名
Sakairi, M.
著者名
Kikuchi, T.
著者名
Nagata, S.
言語
英語
キーワード
Magnesium
Corrosion behavior
Liquid phase deposition
発行日
2011-08-01
出版者
Elsevier
収録物名
Electrochimica Acta
巻(号)
56(20)
ページ
7180-7188
抄録
Liquid phase deposition treatment (LPD) was applied to form a corrosion protective titanium dioxide (TiO2) film on commercially available pure magnesium. Changing the solution pH, from acidic to highly alkaline, and with the addition of sucrose, it becomes possible to form a highly adhesive and thin TiO2 film on commercially available pure magnesium without any heat treatment. The role of the sucrose may be attributed to the formation of tetrafluoroboric acid (BF4)- in the solution reducing the homogeneous nucleation of TiO2 in the LPD solution. The film formed in the weak alkaline environment shows better corrosion resistance than at other LPD conditions, while the average rest potential is the same as that of as-polished specimens. This low rest potential may be due to micro-cracks in the formed film and high activity of the magnesium substrate.
資源タイプ
学術雑誌論文
出版タイプ
Accepted Manuscript
PISSN
0013-4686
関連情報 (isVersionOf)
出版社版DOI
https://doi.org/10.1016/j.electacta.2011.03.146