Tungsten(VI) Oxide Flake-Wall Film Electrodes for Photoelectrochemical Oxygen Evolution from Water

Amano, Fumiaki; Li, Ding; Ohtani, Bunsho

ECS Transactions, 2010, 28(17), 127-133

Permalink : https://hdl.handle.net/2115/50046

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アクセス権
open access
URI
https://hdl.handle.net/2115/50046
タイトル
Tungsten(VI) Oxide Flake-Wall Film Electrodes for Photoelectrochemical Oxygen Evolution from Water
著者
Amano, Fumiaki ; Li, Ding ; Ohtani, Bunsho
e-Rad_Researcher
10431347
著者名
Amano, Fumiaki
著者名
Li, Ding
e-Rad_Researcher
80176924
著者名
Ohtani, Bunsho
言語
英語
発行日
2010
出版者
The Electrochemical Society
収録物名
ECS Transactions
巻(号)
28(17)
ページ
127-133
抄録
A vertically arrayed flake film, "flake-wall film", of monoclinic tungsten(VI) oxide (WO3) was prepared on a transparent conductive glass. The WO3 flake-wall film exhibited superior performance for photoelectrochemical water oxidation under visible-light irradiation compared to that of a film consisting of horizontally laminated WO3 flakes. The small difference between photocurrent densities under front-side irradiation and back-side irradiation indicates the excellent electron transport property of the flake-wall film.
資源タイプ
学術雑誌論文
出版タイプ
Version of Record
権利情報
© The Electrochemical Society, Inc. 2010. All rights reserved. Except as provided under U.S. copyright law, this work may not be reproduced, resold, distributed, or modified without the express permission of The Electrochemical Society (ECS). The archival version of this work was published in ECS Trans. 2010 volume 28, issue 17, 127-133.
PISSN
1938-5862
関連情報 (isIdenticalTo)
出版社版DOI
https://doi.org/10.1149/1.3503359