Attenuated total reflection Fourier transform infrared spectroscopy study of the adsorption of organic contaminants on a hydrogen-terminated Si(111) surface in air

Ye, Shen; Ichihara, Taro; Uosaki, Kohei

Applied Physics Letters, 1999, 75(11), 1562-1564

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アクセス権
open access
URI
https://hdl.handle.net/2115/5502
タイトル
Attenuated total reflection Fourier transform infrared spectroscopy study of the adsorption of organic contaminants on a hydrogen-terminated Si(111) surface in air
著者
Ye, Shen ; Ichihara, Taro ; Uosaki, Kohei
e-Rad_Researcher
40250419
著者名
Ye, Shen
叶, 深
著者名
Ichihara, Taro
e-Rad_Researcher
20133697
著者名
Uosaki, Kohei
言語
英語
発行日
1999
出版者
American Institute of Physics
収録物名
Applied Physics Letters
巻(号)
75(11)
ページ
1562-1564
抄録
The adsorption of organic contaminants on a hydrogen-terminated Si(111) surface was investigated using attenuated total reflection Fourier transform infrared spectroscopy. When the hydrogen-terminated Si(111) surface was exposed to dry air, the sharp Si–H monohydride peak became weaker and a broad component became visible in the lower wave-number region. Furthermore, a number of bands within the C–H stretching region were observed. The intensity of the sharp Si–H band was recovered to a certain extent and those of the broad component and the C–H bands decreased after the sample was rinsed in hexane. These results suggest that the contamination by organic adsorbates is not accompanied by a chemical bond formation.
資源タイプ
学術雑誌論文
出版タイプ
Version of Record
権利情報
Copyright © 1999 American Institute of Physics
PISSN
0003-6951
関連情報
URI
http://www.aip.org/
関連情報 (isIdenticalTo)
出版社版DOI
https://doi.org/10.1063/1.124755