Improvement of Oxidation Resistance of NbSi2 by Addition of Boron

Kurokawa, Kazuya; Yamauchi, Akira; Matsushita, Shinya

Materials Science Forum, 2005, 502, 243-248

Permalink : https://hdl.handle.net/2115/733

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アクセス権
open access
URI
https://hdl.handle.net/2115/733
タイトル
Improvement of Oxidation Resistance of NbSi2 by Addition of Boron
著者
Kurokawa, Kazuya ; Yamauchi, Akira ; Matsushita, Shinya
e-Rad_Researcher
00161779
著者名
Kurokawa, Kazuya
著者名
Yamauchi, Akira
山内, 啓
著者名
Matsushita, Shinya
言語
英語
キーワード
Niobium disilicide
oxidation behavior
oxide scale
addition of boron
improvement of oxidation resistance
発行日
2005
出版者
Trans Tech Publications Inc.
収録物名
Materials Science Forum
巻(号)
502
ページ
243-248
抄録
NbSi2 is a promising candidate as a coating material for Nb-base alloys. However, it shows complicated oxidation behavior, depending on oxidation temperature. In the present study, in order to clarify the oxidation resistance of NbSi2, oxidation tests of sintered NbSi2 were carried out at temperatures ranging from 773 to 1673 K in air. Moreover, the effect of addition of boron on oxidation resistance of NbSi2 was clarified. NbSi2 showed accelerated oxidation at temperatures of 1073 K and above. The accelerated oxidation was caused by formation of a porous oxide layer, which may be due to the phase transformation from amorphous to crystalline SiO2. The addition of boron to NbSi2 leads to the formation of a protective borosilicate layer, resulting in great improvement of the oxidation resistance. Consequently, NbSi2 added with boron shows excellent oxidation resistance up to at least 1673 K.
資源タイプ
学術雑誌論文
出版タイプ
Accepted Manuscript
PISSN
02555476
関連情報
URI
http://www.scientific.net/0-87849-980-6/243/