Sweet Pluronic poly(propylene oxide)-b-oligosaccharide block copolymer systems : Toward sub-4 nm thin-film nanopattern resolution

Mumtaz, Muhammad; Takagi, Yasuko; Mamiya, Hiroaki; Tajima, Kenji; Bouilhac, Cecile; Isono, Takuya; Satoh, Toshifumi; Borsali, Redouane

Sweet Pluronic poly(propylene oxide)-b-oligosaccharide block copolymer systems : Toward sub-4 nm thin-film nanopattern resolution

Mumtaz, Muhammad; Takagi, Yasuko; Mamiya, Hiroaki et al.

European polymer journal, 2020, 134, 109831

Permalink : https://hdl.handle.net/2115/85716

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アクセス権	open access
URI	https://hdl.handle.net/2115/85716
タイトル	Sweet Pluronic poly(propylene oxide)-b-oligosaccharide block copolymer systems : Toward sub-4 nm thin-film nanopattern resolution
著者	Mumtaz, Muhammad ; Takagi, Yasuko ; Mamiya, Hiroaki ; Tajima, Kenji ; Bouilhac, Cecile ; Isono, Takuya ; Satoh, Toshifumi ; Borsali, Redouane
著者名 Mumtaz, Muhammad
著者名 Takagi, Yasuko
著者名 Mamiya, Hiroaki
e-Rad_Researcher 00271643 著者名 Tajima, Kenji
著者名 Bouilhac, Cecile
著者名 Isono, Takuya
e-Rad_Researcher 80291235 著者名 Satoh, Toshifumi
著者名 Borsali, Redouane
言語	英語
キーワード	Block copolymer
	Self-assembly
	Microphase separation
	Oligosaccharide
	Thin film
発行日	2020-07-05
出版者	Elsevier
収録物名	European polymer journal
巻(号)	134
ページ	109831
抄録	Block copolymers (BCPs) with a high Flory-Huggins interaction parameter (chi) are promising alternatives to conventional nanopatterning materials for future nanolithography and nanotechnology applications. Herein, we described AB- and ABA-type BCPs comprising oligosaccharides (maltoheptaose, maltotriose, and maltose as the A block) and poly(propylene oxide) (PPO, as the B block) as new high-chi BCP systems, which can be termed "Sweet Pluronics". The BCPs were successfully synthesized by click reaction between azido-functionalized PPO and propargyl-functionalized maltooligosaccharides. These BCPs undergo microphase separation in bulk state to provide various nanopatterns, i.e., sub-4 nm nanofeatures (cylinders, lamellae, and spheres) with domain spacing as low as 6.2 nm, depending on their composition and the applied annealing conditions. The thin film of these BCPs fabricated on a silicon substrate also showed various microphase-separated structures. When the BCP thin films were subjected to high-temperature solvent vapor annealing using a mu-wave oven as the heating source, their morphologies changed from parallel lamellar to cylindrical because of the preferential swelling of PPO. Overall, these results confirmed that the present "Sweet Pluronics" system is promising high-chi materials for sub-4 nm nanopatterning applications.
資源タイプ	学術雑誌論文
出版タイプ	Accepted Manuscript
権利情報	Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 International
権利情報	©2020. This manuscript version is made available under the CC-BY-NC-ND 4.0 license http://creativecommons.org/licenses/by-nc-nd/4.0/
PISSN	0014-3057
関連情報 (isVersionOf)	出版社版DOI https://doi.org/10.1016/j.eurpolymj.2020.109831