Predicting the amount of carbon in carbon nanotubes grown by CH4 rf plasmas

Okita, Atsushi; Suda, Yoshiyuki; Ozeki, Atsushi; Sugawara, Hirotake; Sakai, Yosuke

Predicting the amount of carbon in carbon nanotubes grown by CH4 rf plasmas

Okita, Atsushi; Suda, Yoshiyuki; Ozeki, Atsushi et al.

Journal of Applied Physics, 2006, 99(1), 014302-1-014302-7

Permalink : https://hdl.handle.net/2115/911

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アクセス権	open access
URI	https://hdl.handle.net/2115/911
タイトル	Predicting the amount of carbon in carbon nanotubes grown by CH4 rf plasmas
著者	Okita, Atsushi ; Suda, Yoshiyuki ; Ozeki, Atsushi ; Sugawara, Hirotake ; Sakai, Yosuke
著者名 Okita, Atsushi
著者名 Suda, Yoshiyuki
著者名 Ozeki, Atsushi
e-Rad_Researcher 90241356 著者名 Sugawara, Hirotake 菅原, 広剛
著者名 Sakai, Yosuke
言語	英語
発行日	2006-01-03
出版者	American Institute of Physics
収録物名	Journal of Applied Physics
巻(号)	99(1)
ページ	014302-1-014302-7
抄録	Carbon nanotubes (CNTs) were grown on Si substrates by rf CH4 plasma-enhanced chemical vapor deposition in a pressure range of 1–10 Torr, and then characterized by scanning electron microscopy. At 1 Torr, the CNTs continued growing up to 60 min, while their height at 4 Torr had leveled off at 20 min. CNTs hardly grew at 10 Torr and amorphous carbon was deposited instead. CH4 plasma was simulated using a one-dimensional fluid model to evaluate the production and transport of radicals, ions, and nonradical neutrals. The amount of simulated carbon supplied to the electrode surface via the flux of radicals and ions such as CH3, C2H5, and C2H was consistent with estimations from experimental results.
資源タイプ	学術雑誌論文
出版タイプ	Version of Record
権利情報	Copyright © 2006 American Institute of Physics
PISSN	0021-8979
関連情報	URI http://www.aip.org/
関連情報 (isIdenticalTo)	出版社版DOI https://doi.org/10.1063/1.2150599