Amorphous Ge under pressure

Tanaka, Keiji

Physical Review B, 1991, 43(5), 4302-4307

Permalink : https://hdl.handle.net/2115/5729

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アクセス権	open access
URI	https://hdl.handle.net/2115/5729
タイトル	Amorphous Ge under pressure
著者	e-Rad_Researcher 20002313 著者名 Tanaka, Keiji 田中, 啓司
言語	英語
発行日	1991-02-15
出版者	American Physical Society
収録物名	Physical Review B
巻(号)	43(5)
ページ	4302-4307
抄録	Pressure effects in sputtered a-Ge and a-Ge:H films have been investigated at room temperature up to 100 kbar. X-ray-diffraction patterns, the bulk compression characteristics, and the optical-absorption spectra for a-Ge show the amorphous-to-crystalline transition at around 60 kbar. The phase transition can be accounted for thermodynamically using a free-energy diagram. The optical-absorption edge in the amorphous films shifts to higher energies with a rate of 1 meV/kbar, which is smaller than the coefficient in the crystalline phase. The origin of the difference can be ascribed to distinct structural modifications in ordered and disordered tetrahedral networks under hydrostatic compression.
資源タイプ	学術雑誌論文
出版タイプ	Version of Record
権利情報	Copyright © 1991 American Physical Society
PISSN	0031-9007
関連情報	URI http://www.aps.org/
関連情報 (isIdenticalTo)	出版社版DOI https://doi.org/10.1103/PhysRevB.43.4302