Patterning of Alkylamine Molecules on Highly Oriented Pyrolytic Graphite Surfaces via Deep UV Light Irradiation

Sato, Yusuke; Kawaguchi, Toshikazu

Chemistry Letters, 2014, 43(10), 1542-1544

Permalink : https://hdl.handle.net/2115/57502

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アクセス権	open access
URI	https://hdl.handle.net/2115/57502
タイトル	Patterning of Alkylamine Molecules on Highly Oriented Pyrolytic Graphite Surfaces via Deep UV Light Irradiation
著者	著者名 Sato, Yusuke
著者	e-Rad_Researcher 90448407 著者名 Kawaguchi, Toshikazu
言語	英語
発行日	2014-10-05
出版者	Chemical Society of Japan
収録物名	Chemistry Letters
巻(号)	43(10)
ページ	1542-1544
抄録	A method for the removal of alkylamine groups and patterning of alkylamine monolayer on carbon surfaces is proposed. Deep UV light irradiation (172 nm) was used to remove alkylamine monolayers from carbon surfaces. When a photomask was employed, patterned alkylamine monolayers were obtained. Labeling of COOH- and NH2-terminated alkylamine monolayers on carbon surfaces with redox probes and fluorescent dyes, respectively, via amide coupling clearly indicated that deep UV light patterning was successfully achieved.
資源タイプ	学術雑誌論文
出版タイプ	Accepted Manuscript
PISSN	0366-7022
関連情報 (isVersionOf)	出版社版DOI https://doi.org/10.1246/cl.140538