Void Engineering in Silica Glass for Ultralow Optical Scattering Loss

Ono, Madoka

Void Engineering in Silica Glass for Ultralow Optical Scattering Loss

Ono, Madoka

Journal Of Lightwave Technology, 2021, 39(16), 5258-5262

Permalink : https://hdl.handle.net/2115/86597

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論文情報

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アクセス権	open access
URI	https://hdl.handle.net/2115/86597
タイトル	Void Engineering in Silica Glass for Ultralow Optical Scattering Loss
著者	e-Rad_Researcher 20865224 著者名 Ono, Madoka
言語	英語
キーワード	Glass
	Silicon compounds
	Rayleigh scattering
	Scattering
	Fluctuations
	Optical losses
	Optical fiber networks
	Pressure
	Rayleigh scattering loss
	silica glass
	void
発行日	2021-08-15
出版者	IEEE (Institute of Electrical and Electronics Engineers)
収録物名	Journal Of Lightwave Technology
巻(号)	39(16)
ページ	5258-5262
抄録	Optical losses in silica glass fibers remain a challenge in their applications. The main contributor to optical attenuation is Rayleigh scattering. This review discusses the recent studies and findings on voids in silica glass and their effects on the optical loss. Through experimental studies of pressure-quenching on glass at the melting temperature, void size shrunk, and the optical loss was reduced to approximately half of that of conventional optical fibers at 0.2 GPa. Our modeling results predicted that further reduction was expected, credited to the optimization of the glass network, called topological pruning, under high compressive pressures of up to 4 GPa.
資源タイプ	学術雑誌論文
出版タイプ	Accepted Manuscript
権利情報	© 2021 Optical Society of America. One print or electronic copy may be made for personal use only. Systematic reproduction and distribution, duplication of any material in this paper for a fee or for commercial purposes, or modifications of the content of this paper are prohibited.
PISSN	0733-8724
EISSN	1558-2213
関連情報 (isVersionOf)	出版社版DOI https://doi.org/10.1109/JLT.2021.3089171