北海道大学工学部研究報告 = Bulletin of the Faculty of Engineering, Hokkaido University;No.166

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Model for Deposition of Thin Films in Plasma CVD

Hino, Tomoaki;Fujita, Ichiro;Yamashina, Toshiro;Ueda, Noriaki;Asami, Naoto;Nishikawa, Masana

Permalink : http://hdl.handle.net/2115/42388

Abstract


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