北海道大学工学部研究報告 = Bulletin of the Faculty of Engineering, Hokkaido University;No.166
HUSCAP
HOME
>
No.166
FONT SIZE:
Model for Deposition of Thin Films in Plasma CVD
Hino, Tomoaki;Fujita, Ichiro;Yamashina, Toshiro;Ueda, Noriaki;Asami, Naoto;Nishikawa, Masana
Permalink :
http://hdl.handle.net/2115/42388
Abstract
FULL TEXT:
PDF