Model for Deposition of Thin Films in Plasma CVD


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Please use this identifier to cite or link to this item:http://hdl.handle.net/2115/42388

Title:	Model for Deposition of Thin Films in Plasma CVD
Authors:	Hino, Tomoaki Browse this author →KAKEN DB
	Fujita, Ichiro Browse this author
	Yamashina, Toshiro Browse this author
	Ueda, Noriaki Browse this author
	Asami, Naoto Browse this author
	Nishikawa, Masana Browse this author
Issue Date:	29-Oct-1993
Publisher:	北海道大学
Journal Title:	北海道大學工學部研究報告
Journal Title(alt):	Bulletin of the Faculty of Engineering, Hokkaido University
Volume:	166
Start Page:	45
End Page:	50
Type:	bulletin (article)
URI:	http://hdl.handle.net/2115/42388
Appears in Collections:	北海道大学工学部研究報告 = Bulletin of the Faculty of Engineering, Hokkaido University > No.166

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