HUSCAP logo Hokkaido Univ. logo

Hokkaido University Collection of Scholarly and Academic Papers >
Institute for Catalysis >
JOURNAL OF THE RESEARCH INSTITUTE FOR CATALYSIS HOKKAIDO UNIVERSITY >
1978 >

ELECTRICAL RESISTANCE OF THIN METALLIC FILMS:DIRECT SCATTERING OF CONDUCTION ELECTRONS BY ADSORBED ATOMS

Files in This Item:
26(3)_P107-130.pdf931.65 kBPDFView/Open
Please use this identifier to cite or link to this item:http://hdl.handle.net/2115/25048

Title: ELECTRICAL RESISTANCE OF THIN METALLIC FILMS:DIRECT SCATTERING OF CONDUCTION ELECTRONS BY ADSORBED ATOMS
Authors: WATANABE, Masao Browse this author
Issue Date: Feb-1979
Publisher: THE RESEARCH INSTITUTE FOR CATALYSIS HOKKAIDO UNIVERSITY
Journal Title: JOURNAL OF THE RESEARCH INSTITUTE FOR CATALYSIS HOKKAIDO UNIVERSITY
Volume: 26
Issue: 3
Start Page: 107
End Page: 130
Type: bulletin (article)
URI: http://hdl.handle.net/2115/25048
Appears in Collections:JOURNAL OF THE RESEARCH INSTITUTE FOR CATALYSIS HOKKAIDO UNIVERSITY > Vol. 26, No. 3 (1978)

Export metadata:

OAI-PMH ( junii2 , jpcoar_1.0 )

MathJax is now OFF:


 

 - Hokkaido University