室温・低周波 （50Hz） プラズマCVD法によるアモルファスカーボン膜の作成と評価


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室温・低周波（50Hz）プラズマCVD法によるアモルファスカーボン膜の作成と評価

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Please use this identifier to cite or link to this item:http://hdl.handle.net/2115/37493

Title:	室温・低周波（50Hz）プラズマCVD法によるアモルファスカーボン膜の作成と評価
Other Titles:	Characteristics of Amorphous Carbon Thin Film by Room Temperature Low Frequancy (50Hz) Plasma CVD
Authors:	下妻, 光夫¹ Browse this author →KAKEN DB
Authors:	田頭, 博昭² Browse this author →KAKEN DB
Authors(alt):	Shimozuma, Mitsuo¹
Authors(alt):	Tagashira, Hiroaki²
Issue Date:	Oct-1988
Publisher:	北海道大学医療技術短期大学部
Journal Title:	北海道大学医療技術短期大学部紀要
Volume:	1
Start Page:	73
End Page:	83
Type:	bulletin (article)
URI:	http://hdl.handle.net/2115/37493
Appears in Collections:	北海道大学医療技術短期大学部紀要 > 第1号

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