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北海道大学工学部研究報告 = Bulletin of the Faculty of Engineering, Hokkaido University >
No.112 >

最近のエリプソ・インタフェロメトリの研究 : 薄膜の膜厚および光学定数分布の新しい測定法

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Please use this identifier to cite or link to this item:http://hdl.handle.net/2115/41775

Title: 最近のエリプソ・インタフェロメトリの研究 : 薄膜の膜厚および光学定数分布の新しい測定法
Other Titles: Recent Trends of Studies on Ellipso-Interferometry : A New Techique for the Determination of Two Dimensional Distributions of Thickness and Optical Constants of Thin Films
Authors: 三島, 瑛人1 Browse this author
Authors(alt): Mishima, Teruhito1
Issue Date: 31-Jan-1983
Publisher: 北海道大学
Journal Title: 北海道大學工學部研究報告
Journal Title(alt): Bulletin of the Faculty of Engineering, Hokkaido University
Volume: 112
Start Page: 47
End Page: 55
Type: bulletin (article)
URI: http://hdl.handle.net/2115/41775
Appears in Collections:北海道大学工学部研究報告 = Bulletin of the Faculty of Engineering, Hokkaido University > No.112

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