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北海道大学工学部研究報告 = Bulletin of the Faculty of Engineering, Hokkaido University >
No.143 >
イオンミキシング法による低温におけるニッケルシリサイドの形成
Title: | イオンミキシング法による低温におけるニッケルシリサイドの形成 |
Other Titles: | Formation of Silisides at Low Temperature by means of Ion-Beam Mixing Method |
Authors: | 大貫, 惣明1 Browse this author | 木村, 幸治2 Browse this author | 高橋, 平七郎3 Browse this author | 長崎, 隆吉4 Browse this author |
Authors(alt): | Ohnuki, S1 | Kimura, K2 | Takahashi, H3 | Nagasaki, R4 |
Issue Date: | 30-Sep-1988 |
Publisher: | 北海道大学 |
Journal Title: | 北海道大學工學部研究報告 |
Journal Title(alt): | Bulletin of the Faculty of Engineering, Hokkaido University |
Volume: | 143 |
Start Page: | 11 |
End Page: | 21 |
Type: | bulletin (article) |
URI: | http://hdl.handle.net/2115/42138 |
Appears in Collections: | 北海道大学工学部研究報告 = Bulletin of the Faculty of Engineering, Hokkaido University > No.143
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