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北海道大学工学部研究報告 = Bulletin of the Faculty of Engineering, Hokkaido University >
No.143 >

イオンミキシング法による低温におけるニッケルシリサイドの形成

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Please use this identifier to cite or link to this item:http://hdl.handle.net/2115/42138

Title: イオンミキシング法による低温におけるニッケルシリサイドの形成
Other Titles: Formation of Silisides at Low Temperature by means of Ion-Beam Mixing Method
Authors: 大貫, 惣明1 Browse this author
木村, 幸治2 Browse this author
高橋, 平七郎3 Browse this author
長崎, 隆吉4 Browse this author
Authors(alt): Ohnuki, S1
Kimura, K2
Takahashi, H3
Nagasaki, R4
Issue Date: 30-Sep-1988
Publisher: 北海道大学
Journal Title: 北海道大學工學部研究報告
Journal Title(alt): Bulletin of the Faculty of Engineering, Hokkaido University
Volume: 143
Start Page: 11
End Page: 21
Type: bulletin (article)
URI: http://hdl.handle.net/2115/42138
Appears in Collections:北海道大学工学部研究報告 = Bulletin of the Faculty of Engineering, Hokkaido University > No.143

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