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北海道大学工学部研究報告 = Bulletin of the Faculty of Engineering, Hokkaido University >
No.143 >

高分解能電子顕微鏡による化合物半導体/酸化絶縁膜界面構造の観察

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Title: 高分解能電子顕微鏡による化合物半導体/酸化絶縁膜界面構造の観察
Other Titles: Observation of Interfaces of Compound Semiconductors by High Resolution Electron Microscope
Authors: 高橋, 平七郎1 Browse this author
柴山, 環樹2 Browse this author
長谷川, 英樹3 Browse this author
大野, 英男4 Browse this author
Authors(alt): Takahashi, Heishichiro1
Shibayama, Tamaki2
Hasegawa, Hideki3
Ohno, Hideo4
Issue Date: 30-Sep-1988
Publisher: 北海道大学
Journal Title: 北海道大學工學部研究報告
Journal Title(alt): Bulletin of the Faculty of Engineering, Hokkaido University
Volume: 143
Start Page: 1
End Page: 10
Type: bulletin (article)
URI: http://hdl.handle.net/2115/42147
Appears in Collections:北海道大学工学部研究報告 = Bulletin of the Faculty of Engineering, Hokkaido University > No.143

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