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北海道大学工学部研究報告 = Bulletin of the Faculty of Engineering, Hokkaido University >
No.143 >
高分解能電子顕微鏡による化合物半導体/酸化絶縁膜界面構造の観察
Title: | 高分解能電子顕微鏡による化合物半導体/酸化絶縁膜界面構造の観察 |
Other Titles: | Observation of Interfaces of Compound Semiconductors by High Resolution Electron Microscope |
Authors: | 高橋, 平七郎1 Browse this author | 柴山, 環樹2 Browse this author | 長谷川, 英樹3 Browse this author | 大野, 英男4 Browse this author |
Authors(alt): | Takahashi, Heishichiro1 | Shibayama, Tamaki2 | Hasegawa, Hideki3 | Ohno, Hideo4 |
Issue Date: | 30-Sep-1988 |
Publisher: | 北海道大学 |
Journal Title: | 北海道大學工學部研究報告 |
Journal Title(alt): | Bulletin of the Faculty of Engineering, Hokkaido University |
Volume: | 143 |
Start Page: | 1 |
End Page: | 10 |
Type: | bulletin (article) |
URI: | http://hdl.handle.net/2115/42147 |
Appears in Collections: | 北海道大学工学部研究報告 = Bulletin of the Faculty of Engineering, Hokkaido University > No.143
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