HUSCAP logo Hokkaido Univ. logo

Hokkaido University Collection of Scholarly and Academic Papers >
Graduate School of Engineering / Faculty of Engineering >
北海道大学工学部研究報告 = Bulletin of the Faculty of Engineering, Hokkaido University >
No.161 >

反応性スパッタリングで蒸着したアルミナ薄膜の抗血栓性に関する基礎的研究 : 蒸着時における酸素分圧の影響

Files in This Item:
161_55-62.pdf685.77 kBPDFView/Open
Please use this identifier to cite or link to this item:http://hdl.handle.net/2115/42319

Title: 反応性スパッタリングで蒸着したアルミナ薄膜の抗血栓性に関する基礎的研究 : 蒸着時における酸素分圧の影響
Other Titles: A Primary Study of the Antithrombogenesis of Deposited Alumina Film by Reactive Sputtering : Effect of Oxygen Partial Pressure in Sputtering
Authors: 菊田, 幸明1 Browse this author
中兼, 雅之2 Browse this author
西村, 生哉3 Browse this author →KAKEN DB
見藤, 歩4 Browse this author
村林, 俊5 Browse this author
勇田, 敏夫6 Browse this author
Authors(alt): Kikuta, Yukiaki1
Nakagane, Masayuki2
Nishimura, Ikuya3
Mitoh, Ayumi4
Murabayashi, Shun5
Yuhta, Toshio6
Issue Date: 16-Oct-1992
Publisher: 北海道大学
Journal Title: 北海道大學工學部研究報告
Journal Title(alt): Bulletin of the Faculty of Engineering, Hokkaido University
Volume: 161
Start Page: 55
End Page: 62
Type: bulletin (article)
URI: http://hdl.handle.net/2115/42319
Appears in Collections:北海道大学工学部研究報告 = Bulletin of the Faculty of Engineering, Hokkaido University > No.161

Export metadata:

OAI-PMH ( junii2 , jpcoar_1.0 )

MathJax is now OFF:


 

 - Hokkaido University