HUSCAP logo Hokkaido Univ. logo

Hokkaido University Collection of Scholarly and Academic Papers >
Graduate School of Engineering / Faculty of Engineering >
北海道大学工学部研究報告 = Bulletin of the Faculty of Engineering, Hokkaido University >
No.169 >

Model for Hydrogen Retention and Chemical Sputtering of Boron-Carbon Plasma Facing Material

Files in This Item:
169_41-48.pdf441.91 kBPDFView/Open
Please use this identifier to cite or link to this item:http://hdl.handle.net/2115/42427

Title: Model for Hydrogen Retention and Chemical Sputtering of Boron-Carbon Plasma Facing Material
Authors: Hino, Tomoaki Browse this author →KAKEN DB
Yamauchi, Yuji Browse this author
Yamashina, Toshiro Browse this author
Issue Date: 28-Jun-1994
Publisher: 北海道大学
Journal Title: 北海道大學工學部研究報告
Journal Title(alt): Bulletin of the Faculty of Engineering, Hokkaido University
Volume: 169
Start Page: 41
End Page: 48
Type: bulletin (article)
URI: http://hdl.handle.net/2115/42427
Appears in Collections:北海道大学工学部研究報告 = Bulletin of the Faculty of Engineering, Hokkaido University > No.169

Export metadata:

OAI-PMH ( junii2 , jpcoar_1.0 )

MathJax is now OFF:


 

 - Hokkaido University