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北海道大学工学部研究報告 = Bulletin of the Faculty of Engineering, Hokkaido University >
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プラズマプロセスによるSiの表面窒化

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Please use this identifier to cite or link to this item:http://hdl.handle.net/2115/42477

Title: プラズマプロセスによるSiの表面窒化
Other Titles: Surface Nitrization of Si by Plasma Processing
Authors: 原田, 誠1 Browse this author
広畑, 優子2 Browse this author →KAKEN DB
藤田, 一郎3 Browse this author →KAKEN DB
日野, 友明4 Browse this author →KAKEN DB
山科, 俊郎5 Browse this author →KAKEN DB
Authors(alt): Harada, Makoto1
Hirohata, Yuko2
Fujita, Ichiro3
Hino, Tomoaki4
Yamashina, Toshiro5
Issue Date: 15-Oct-1996
Publisher: 北海道大学工学部
Journal Title: 北海道大學工學部研究報告
Journal Title(alt): Bulletin of the Faculty of Engineering, Hokkaido University
Volume: 178
Start Page: 25
End Page: 33
Type: bulletin (article)
URI: http://hdl.handle.net/2115/42477
Appears in Collections:北海道大学工学部研究報告 = Bulletin of the Faculty of Engineering, Hokkaido University > No.178

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