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Hokkaido University Collection of Scholarly and Academic Papers >
Graduate School of Engineering / Faculty of Engineering >
北海道大学工学部研究報告 = Bulletin of the Faculty of Engineering, Hokkaido University >
No.178 >
プラズマプロセスによるSiの表面窒化
| Title: | プラズマプロセスによるSiの表面窒化 |
| Other Titles: | Surface Nitrization of Si by Plasma Processing |
| Authors: | 原田, 誠1 Browse this author | | 広畑, 優子2 Browse this author →KAKEN DB | | 藤田, 一郎3 Browse this author →KAKEN DB | | 日野, 友明4 Browse this author →KAKEN DB | | 山科, 俊郎5 Browse this author →KAKEN DB |
| Authors(alt): | Harada, Makoto1 | | Hirohata, Yuko2 | | Fujita, Ichiro3 | | Hino, Tomoaki4 | | Yamashina, Toshiro5 |
| Issue Date: | 15-Oct-1996 |
| Publisher: | 北海道大学工学部 |
| Journal Title: | 北海道大學工學部研究報告 |
| Journal Title(alt): | Bulletin of the Faculty of Engineering, Hokkaido University |
| Volume: | 178 |
| Start Page: | 25 |
| End Page: | 33 |
| Type: | bulletin (article) |
| URI: | http://hdl.handle.net/2115/42477 |
| Appears in Collections: | 北海道大学工学部研究報告 = Bulletin of the Faculty of Engineering, Hokkaido University > No.178
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