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Quantum lithography under imperfect conditions : effects of loss and dephasing on two-photon interference fringes

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Title: Quantum lithography under imperfect conditions : effects of loss and dephasing on two-photon interference fringes
Authors: Fujiwara, Hideki Browse this author →KAKEN DB
Kawabe, Yoshio Browse this author
Okamoto, Ryo Browse this author →KAKEN DB
Takeuchi, Shigeki Browse this author →KAKEN DB
Sasaki, Keiji Browse this author →KAKEN DB
Issue Date: 1-Mar-2011
Publisher: Optical Society of America
Journal Title: Journal of the Optical Society of America B : Optical Physics
Volume: 28
Issue: 3
Start Page: 422
End Page: 431
Publisher DOI: 10.1364/JOSAB.28.000422
Abstract: We propose a method to simulate a two-photon interference fringe by using a density matrix in order to describe various types of imperfections in the input state. Using this method, we numerically discuss the influence of various imperfections in an input state, such as dephasing and misalignment, on the quality (visibility and period) of the two-photon interference fringes. Applying this method to experimental data, we succeeded in numerically reproducing a two-photon interference fringe using the experimentally obtained density matrix, in which almost no free fitting parameters are required. From the results, because the main cause of the degradation of an interference fringe was found to be the limited aperture size of a two-photon detector, we can observe a two-photon interference fringe with a visibility of up to 94% in the experiments if an efficient two-photon absorbing material or a two-photon detector with a sufficiently high spatial resolution can be used.
Rights: © 2011 Optical Society of America
Type: article
URI: http://hdl.handle.net/2115/45032
Appears in Collections:電子科学研究所 (Research Institute for Electronic Science) > 雑誌発表論文等 (Peer-reviewed Journal Articles, etc)

Submitter: 藤原 英樹

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