HUSCAP logo Hokkaido Univ. logo

Hokkaido University Collection of Scholarly and Academic Papers >
Research Institute for Electronic Science >
Peer-reviewed Journal Articles, etc >

Homogeneous nano-patterning using plasmon-assisted photolithography

Files in This Item:
APL99-1_011107.pdf2.24 MBPDFView/Open
Please use this identifier to cite or link to this item:

Title: Homogeneous nano-patterning using plasmon-assisted photolithography
Authors: Ueno, Kosei Browse this author
Takabatake, Satoaki Browse this author
Onishi, Ko Browse this author
Itoh, Hiroko Browse this author
Nishijima, Yoshiaki Browse this author
Misawa, Hiroaki Browse this author
Issue Date: 4-Jul-2011
Publisher: American Institute of Physics
Journal Title: Applied Physics Letters
Volume: 99
Issue: 1
Start Page: 011107
Publisher DOI: 10.1063/1.3606505
Abstract: We report an innovative lithography system appropriate for fabricating sharp-edged nanodot patterns with nanoscale accuracy using plasmon-assisted photolithography. The key technology is two-photon photochemical reactions of a photoresist induced by plasmonic near-field light and the scattering component of the light in a photoresist film. The scattering component of the light is a radiation mode from higher order localized surface plasmon resonances scattered by metallic nanostructures.
Rights: Copyright 2011 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics. The following article appeared in Appl. Phys. Lett. 99, 011107 (2011) and may be found at
Type: article
Appears in Collections:電子科学研究所 (Research Institute for Electronic Science) > 雑誌発表論文等 (Peer-reviewed Journal Articles, etc)

Submitter: 上野 貢生

Export metadata:

OAI-PMH ( junii2 , jpcoar_1.0 )

MathJax is now OFF:


 - Hokkaido University