Homogeneous nano-patterning using plasmon-assisted photolithography


Hokkaido University \| Library \| HUSCAP	Advanced Search		言語

	Home
	About HUSCAP
	Open Access Policy

	Browse by Author

Browse
	Communities & Collections

	Scholarly Journals
	Theses
	Doctoral Dissertations Listed by Graduate Schools
	Conference Procs.
	Events

	HUSCAP Senior (in Japanese)

	Societies

	Downloads (country)

For university staff
	How to post your papers to HUSCAP
	Publication of theses
	Helpline about theses publication

Open Archives Compliant

You can search our collection also at:
	Google
	Google Scholar
	CiNii
	IRDB
	OAIster
	NDLTD

Files in This Item:

APL99-1_011107.pdf

2.24 MB

PDF

Please use this identifier to cite or link to this item:http://hdl.handle.net/2115/46881

Title:	Homogeneous nano-patterning using plasmon-assisted photolithography
Authors:	Ueno, Kosei Browse this author
	Takabatake, Satoaki Browse this author
	Onishi, Ko Browse this author
	Itoh, Hiroko Browse this author
	Nishijima, Yoshiaki Browse this author
	Misawa, Hiroaki Browse this author
Issue Date:	4-Jul-2011
Publisher:	American Institute of Physics
Journal Title:	Applied Physics Letters
Volume:	99
Issue:	1
Start Page:	011107
Publisher DOI:	10.1063/1.3606505
Abstract:	We report an innovative lithography system appropriate for fabricating sharp-edged nanodot patterns with nanoscale accuracy using plasmon-assisted photolithography. The key technology is two-photon photochemical reactions of a photoresist induced by plasmonic near-field light and the scattering component of the light in a photoresist film. The scattering component of the light is a radiation mode from higher order localized surface plasmon resonances scattered by metallic nanostructures.
Rights:	Copyright 2011 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics. The following article appeared in Appl. Phys. Lett. 99, 011107 (2011) and may be found at https://dx.doi.org/10.1063/1.3606505
Type:	article
URI:	http://hdl.handle.net/2115/46881
Appears in Collections:	電子科学研究所 (Research Institute for Electronic Science) > 雑誌発表論文等 (Peer-reviewed Journal Articles, etc)

Submitter: 上野貢生

OAI-PMH ( junii2 , jpcoar_1.0 )

- Hokkaido University