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Low-temperature fabrication of fine structures on glass using electrical nanoimprint and chemical etching

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Title: Low-temperature fabrication of fine structures on glass using electrical nanoimprint and chemical etching
Authors: Ikutame, Naoki Browse this author
Kawaguchi, Keiga Browse this author
Ikeda, Hiroshi Browse this author
Sakai, Daisuke Browse this author
Harada, Kenji Browse this author →KAKEN DB
Funatsu, Shiro Browse this author
Nishii, Junji Browse this author →KAKEN DB
Issue Date: 28-Aug-2013
Publisher: American Institute of Physics
Journal Title: Journal of applied physics
Volume: 114
Issue: 8
Start Page: 083514-1
End Page: 083514-4
Publisher DOI: 10.1063/1.4819321
Abstract: Periodic structures were imprinted on a soda lime glass surface below its glass transition temperature (T-g) using a carbon-coated SiO2 mold under application of DC voltage. The structure height increased with the applied DC voltage, although no significant increase with pressure was found. At a temperature around T-g, the height reached saturation. Chemical etching using 55% KOH solution at 70 degrees C increased the structure height to eight times the height before etching. Noticeable alternating depression patterns and rapid chemical etching are closely related with the selective decrease in sodium concentration, which occurred only in the surface areas that were pressurized by the mold. (C) 2013 AIP Publishing LLC.
Rights: Copyright 2013 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics. The following article appeared in Journal of Applied Physics 114, 083514 (2013) and may be found at http://scitation.aip.org/content/aip/journal/jap/114/8/10.1063/1.4819321
Type: article
URI: http://hdl.handle.net/2115/53435
Appears in Collections:電子科学研究所 (Research Institute for Electronic Science) > 雑誌発表論文等 (Peer-reviewed Journal Articles, etc)

Submitter: 酒井 大輔

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