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Optical emission diagnostics of H2+CH4 50-Hz–13.56-MHz plasmas for chemical vapor deposition
| Title: | Optical emission diagnostics of H2+CH4 50-Hz–13.56-MHz plasmas for chemical vapor deposition |
| Authors: | Shimozuma, Mitsuo1 Browse this author →KAKEN DB | | Tochitani, Gen Browse this author | | Tagashira, Hiroaki Browse this author →KAKEN DB |
| Authors(alt): | 下妻, 光夫1 |
| Issue Date: | 15-Jul-1991 |
| Publisher: | American Institute of Physics |
| Journal Title: | Journal of Applied Physics |
| Volume: | 70 |
| Issue: | 2 |
| Start Page: | 645 |
| End Page: | 648 |
| Publisher DOI: | 10.1063/1.349667 |
| Abstract: | The emission spectra of H2+CH4 plasmas excited at 50 Hz–13.56 MHz were measured. The emission intensity ratios of Hα/H*2 (3Σg→3Σu) from H2+CH4 plasma at 50 Hz and 13.56 MHz were about 0.7 and 0.05, respectively. The electron temperature was obtained from the two-line radiance ratio method using the Balmer lines (Hα and Hβ), and rapidly decreased with an increase above 200 kHz. The electron temperature for H2+CH4 plasma is 16 000 K at 1 kHz and 8200 K at 13.56 MHz. The plasma-maintaining voltages for H2 and H2+CH4 mixtures were also measured. The maintaining voltages were constant below 200 kHz, and rapidly decreased between 200 kHz and 13.56 MHz. The position dependence of emission intensity was also measured for Hα, Hβ, and H*2 at 50 Hz and 13.56 MHz. The results are interpreted in terms of the electron distribution in the plasma. |
| Rights: | Copyright © 1991 American Institute of Physics |
| Relation: | http://www.aip.org/ |
| Type: | article |
| URI: | http://hdl.handle.net/2115/5527 |
| Appears in Collections: | 医学院・医学研究院 (Graduate School of Medicine / Faculty of Medicine) > 雑誌発表論文等 (Peer-reviewed Journal Articles, etc)
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Submitter: 下妻 光夫
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