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Optical emission diagnostics of H2+CH4 50-Hz–13.56-MHz plasmas for chemical vapor deposition

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Title: Optical emission diagnostics of H2+CH4 50-Hz–13.56-MHz plasmas for chemical vapor deposition
Authors: Shimozuma, Mitsuo1 Browse this author →KAKEN DB
Tochitani, Gen Browse this author
Tagashira, Hiroaki Browse this author →KAKEN DB
Authors(alt): 下妻, 光夫1
Issue Date: 15-Jul-1991
Publisher: American Institute of Physics
Journal Title: Journal of Applied Physics
Volume: 70
Issue: 2
Start Page: 645
End Page: 648
Publisher DOI: 10.1063/1.349667
Abstract: The emission spectra of H2+CH4 plasmas excited at 50 Hz–13.56 MHz were measured. The emission intensity ratios of Hα/H*2 (3Σg→3Σu) from H2+CH4 plasma at 50 Hz and 13.56 MHz were about 0.7 and 0.05, respectively. The electron temperature was obtained from the two-line radiance ratio method using the Balmer lines (Hα and Hβ), and rapidly decreased with an increase above 200 kHz. The electron temperature for H2+CH4 plasma is 16 000 K at 1 kHz and 8200 K at 13.56 MHz. The plasma-maintaining voltages for H2 and H2+CH4 mixtures were also measured. The maintaining voltages were constant below 200 kHz, and rapidly decreased between 200 kHz and 13.56 MHz. The position dependence of emission intensity was also measured for Hα, Hβ, and H*2 at 50 Hz and 13.56 MHz. The results are interpreted in terms of the electron distribution in the plasma.
Rights: Copyright © 1991 American Institute of Physics
Relation: http://www.aip.org/
Type: article
URI: http://hdl.handle.net/2115/5527
Appears in Collections:医学院・医学研究院 (Graduate School of Medicine / Faculty of Medicine) > 雑誌発表論文等 (Peer-reviewed Journal Articles, etc)

Submitter: 下妻 光夫

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