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Hydrogenated amorphous carbon films deposited by low-frequency plasma chemical vapor deposition at room temperature

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Please use this identifier to cite or link to this item:http://hdl.handle.net/2115/6057

Title: Hydrogenated amorphous carbon films deposited by low-frequency plasma chemical vapor deposition at room temperature
Authors: Shimozuma, M.1 Browse this author →KAKEN DB
Tochitani, G. Browse this author
Ohno, H. Browse this author
Tagashira, H. Browse this author
Nakahara, J. Browse this author
Authors(alt): 下妻, 光夫1
Issue Date: 1-Jul-1989
Publisher: American Institute of Physics
Journal Title: Journal of Applied Physics
Volume: 66
Issue: 1
Start Page: 447
End Page: 449
Abstract: Provides information on hydrogenated amorphous carbon films prepared at room temperature by low frequency plasma chemical vapor deposition using methane and hydrogen. Measurement of resistivity and breakdown electric field after deposition; Infrared absorption spectrum of the grown film for the carbon-hydrogen stretching mode region; Raman spectroscopy using argon laser excitation.
Description URI: http://search.epnet.com/login.aspx?direct=true&db=afh&an=7648244
Rights: Copyright © 1989 American Institute of Physics
Relation: http://www.aip.org/
Type: article
URI: http://hdl.handle.net/2115/6057
Appears in Collections:医学院・医学研究院 (Graduate School of Medicine / Faculty of Medicine) > 雑誌発表論文等 (Peer-reviewed Journal Articles, etc)

Submitter: 下妻 光夫

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