パターン依存酸化法と再酸化で作製したシリコンマルチ結合量子ドットに関する研究 [論文内容及び審査の要旨]


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Files in This Item:

Takafumi_Uchida_abstract.pdf	論文内容の要旨	10.72 kB	PDF	View/Open
Takafumi_Uchida_review.pdf	審査の要旨	11.82 kB	PDF	View/Open

Please use this identifier to cite or link to this item:http://hdl.handle.net/2115/65486

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Title:	パターン依存酸化法と再酸化で作製したシリコンマルチ結合量子ドットに関する研究 [論文内容及び審査の要旨]
Other Titles:	Silicon multiple-coupled-quantum dots fabricated by pattern-dependent oxidation and additional oxidation[an abstract of dissertation and a summary of dissertation review]
Authors:	内田, 貴史 Browse this author
Issue Date:	23-Mar-2017
Publisher:	Hokkaido University
Conffering University:	北海道大学
Degree Report Number:	甲第12626号
Degree Level:	博士
Degree Discipline:	工学
Examination Committee Members:	(主査) 教授葛西誠也, 教授富田章久, 准教授有田正志
Degree Affiliation:	情報科学研究科（情報エレクトロニクス専攻）
Rights:	http://creativecommons.org/licenses/by-nc-sa/2.1/jp/
Type:	theses (doctoral - abstract and summary of review)
URI:	http://hdl.handle.net/2115/65486
Appears in Collections:	学位論文 (Theses) > 博士　（工学）課程博士 (Doctorate by way of Advanced Course) > 情報科学院(Graduate School of Information Science and Technology)

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