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Coexistence of High Electron Conduction and Low Heat Conduction in Tungsten Oxide Epitaxial Films with 1D Atomic Defect Tunnels

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Please use this identifier to cite or link to this item:http://hdl.handle.net/2115/82516

Title: Coexistence of High Electron Conduction and Low Heat Conduction in Tungsten Oxide Epitaxial Films with 1D Atomic Defect Tunnels
Authors: Kim, Gowoon Browse this author
Feng, Bin Browse this author
Sheu, Yu-Miin Browse this author
Cho, Hai Jun Browse this author
Ikuhara, Yuichi Browse this author
Ohta, Hiromichi Browse this author →KAKEN DB
Keywords: thermal conductivity
electrical conductivity
tungsten oxide
1D atomic defect tunnel
epitaxial film
pulsed laser deposition
Issue Date: 25-Aug-2020
Publisher: American Chemical Society
Journal Title: ACS Applied Electronic Materials
Volume: 2
Issue: 8
Start Page: 2507
End Page: 2513
Publisher DOI: 10.1021/acsaelm.0c00428
Abstract: Materials showing unusual electron and heat conduction such as the coexistence of high electron conduction and low heat conduction are essentially important to realize efficient thermal management systems. Although introducing point defects or layers is known as an effective way to reduce the thermal conductivity, the coexistence of high electron conduction and low heat conduction is still challenging because of the fact that electrons and phonons are scattered simultaneously by impurities, defects, and boundaries. Although oxygen-deficient tungsten oxide (WOx) films (2.7 < x < 3.0) show the desired properties, the origin is still unclear. Here, we report that one-dimensional (1D) atomic defect tunnels give rise to the coexistence of low thermal conductivity and high electrical conductivity of WOx films. We fabricated WOx epitaxial films on LaAlO3 substrates under a precisely controlled oxygen atmosphere. Crystallographic analyses revealed that 1D atomic defect tunnels are formed randomly along the rectangular-shaped grains in the in-plane direction. The cross-plane thermal conductivity of the WOx films dramatically decreased with decreasing x, while the electrical conductivity drastically increased because of an increase of carrier electrons, and high electron conduction and low heat conduction coexist when x < 2.9. The present finding would be useful to design efficient thermal management materials.
Rights: This document is the Accepted Manuscript version of a Published Work that appeared in final form in ACS Applied Electronic Materials, copyright © American Chemical Society after peer review and technical editing by the publisher. To access the final edited and published work see https://pubs.acs.org/doi/10.1021/acsaelm.0c00428 .
Type: article (author version)
URI: http://hdl.handle.net/2115/82516
Appears in Collections:電子科学研究所 (Research Institute for Electronic Science) > 雑誌発表論文等 (Peer-reviewed Journal Articles, etc)

Submitter: 太田 裕道

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