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Void Engineering in Silica Glass for Ultralow Optical Scattering Loss

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Title: Void Engineering in Silica Glass for Ultralow Optical Scattering Loss
Authors: Ono, Madoka Browse this author →KAKEN DB
Keywords: Glass
Silicon compounds
Rayleigh scattering
Optical losses
Optical fiber networks
Rayleigh scattering loss
silica glass
Issue Date: 15-Aug-2021
Publisher: IEEE (Institute of Electrical and Electronics Engineers)
Journal Title: Journal Of Lightwave Technology
Volume: 39
Issue: 16
Start Page: 5258
End Page: 5262
Publisher DOI: 10.1109/JLT.2021.3089171
Abstract: Optical losses in silica glass fibers remain a challenge in their applications. The main contributor to optical attenuation is Rayleigh scattering. This review discusses the recent studies and findings on voids in silica glass and their effects on the optical loss. Through experimental studies of pressure-quenching on glass at the melting temperature, void size shrunk, and the optical loss was reduced to approximately half of that of conventional optical fibers at 0.2 GPa. Our modeling results predicted that further reduction was expected, credited to the optimization of the glass network, called topological pruning, under high compressive pressures of up to 4 GPa.
Rights: © 2021 Optical Society of America. One print or electronic copy may be made for personal use only. Systematic reproduction and distribution, duplication of any material in this paper for a fee or for commercial purposes, or modifications of the content of this paper are prohibited.
Type: article (author version)
Appears in Collections:電子科学研究所 (Research Institute for Electronic Science) > 雑誌発表論文等 (Peer-reviewed Journal Articles, etc)

Submitter: 小野 円佳

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