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TypeAuthor(s)TitleOther TitlesCitationCitation(alt)Issue Date
articleShimozuma, M.; Date, H.; Iwasaki, T.; Tagashira, H.; Yoshino, M.; Yoshida, K.Three-dimensional deposition of TiN film using low frequency (50 Hz) plasma chemical vapor deposition-Journal of Vacuum Science & Technology. A, Vacuum, Surfaces, and Films-Jul-1997
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